Alternating Plugging Process for DPF Wall-flow Substrates


AddTime: 2026-08-21 Print Favorites Email: info@169chem.net
A brief introduction to the alternating plugging process for DPF wall-flow substrates.

Alternating Plugging Process for DPF Wall-flow Substrates

Alternating plugging is a critical step in transforming a flow-through honeycomb ceramic into a wall-flow DPF substrate; by alternately plugging the ends of the channels, exhaust gas is forced to pass through the channel walls, thereby capturing particulate matter.

Plugging Principle

Adjacent channels are plugged at one end and left open at the other, creating an alternating checkerboard pattern:

Channels plugged at the inlet end are open at the outlet end.

Channels open at the inlet end are plugged at the outlet end.

Exhaust gas enters through channels open at the inlet end → reaches the plugged end → is forced through the channel walls → enters adjacent channels → exits through the outlet end; particulate matter is trapped during the wall-passage process.

Plugging Slurry

Component

Function

Proportion

Carrier material powder

Same material as the carrier; ensures bonding

50%-70%

Binder

Enhances bonding strength

3%-8%

Water

Adjusts viscosity

20%-40%

Slurry fineness ≤10 μm; solids content 35%–45%.

Sealing Process Steps

Step

Operation

Key Parameters

①Inlet-end protection

Cover channels to remain open; expose channels to be plugged

Alignment deviation ≤0.5 mm

② Inlet-end plugging

Vacuum-assisted slurry filling of unprotected channels

Plugging depth: 5–15 mm

③ Drying

Curing at 80–120°C

2–4 hours

④ Outlet-end plugging

Flip over and repeat steps ①–② to plug the remaining channels

Reverse checkerboard pattern

⑤ Sintering/Curing

Sintering at 1000–1200°C

2–4 hours

Summary

The DPF alternating plugging process can be summarized as follows: checkerboard masking of the inlet → vacuum filling → drying → reverse plugging of the outlet → sintering and curing. Key parameters include a plugging depth of 5–15 mm, a slurry solids content of 35%–45%, and an alignment accuracy of ≤0.5 mm. Plugging depth directly affects pressure drop (increasing by 3%–5% for every 1 mm increase in depth), requiring optimization between filtration efficiency and backpressure. This process is the core technology for converting flow-through substrates into wall-flow filters.

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